Suzhou Takchip Semiconductor Co., Ltd.

TKP-600P

Full-Wafer Plasma Etching Equipment TKP-600P
The Taiyan TKP-600P board-level plasma etching machine efficiently executes processes such as cleaning, surface modification, activation, roughening, desmearing, and micro-etching for board-level products. Featuring a modular design, the equipment incorporates core components—including a highly stable vacuum chamber, a multi-channel precision gas mixing system, and an efficient vacuum pumping system—to ensure a stable and controllable process flow. It is compatible with organic substrates such as EMC, ABF, PET, and PI, as well as inorganic materials including glass, ceramics, SiO2, SiC, and silicon wafers; the system is capable of processing PCBs, IC carrier boards, and advanced packaging substrates with maximum dimensions of 600 × 600 mm.
Full-Wafer Plasma Etching Equipment TKP-600P
Application
Product Applications

De-adhesive after dry film development

ABF Desmearing After Laser Drilling

Glass Surface Micro-etching

Specifications
Technical Specifications

Parameter

Content

Parameter

Content

Equipment Dimensions

1900 × 1500 × 2100 mm (L × W × H)

Temperature Control System

25–80°C (±0.1°C)

Vacuum System

Dry Pump: Pumping speed 600 m³/h, Ultimate vacuum 0.5 Pa; Turbomolecular Pump: Speed 33,000 rpm, Pumping speed (N₂): 300 L/s; Butterfly Valve: Control accuracy 0.1%; Vacuum Gauge: 1 × 10⁻³ Torr; Leak Rate: < 20 mTorr/min

RF Power Supply

3000 W

Process Performance

Etch Rate: >150 nm/min @ ABF; Uniformity: <10%

Gas Control

10–300 SCCM

Chamber Material

SUS304 Stainless Steel

 

 

Copyright © Suzhou Takchip Semiconductor Co., Ltd. All rights reserved SuICP No. 2024094040-1 Web design