Suzhou Takchip Semiconductor Co., Ltd.
TKP 200A

TKP 200A Semiconductor Wafer Inspection System
· Features an Open Cassette
· SMIF cassette interface, with optional standard shared open cassette
· Ceramic dual-arm end-of-line processor suitable for warped wafers
· Equipped with macro inspection capabilities
· Optional DUV optical system for CD measurement
· Optional infrared (IR) optical system
· Wafer Map function included as standard
· Supports import of KLAF/Bin Map files
TKP 200A Semiconductor Wafer Inspection System

UniDRON-Semi Technology


TKP 200A Specification Sheet

Specimen dimensions

6/8 inch 

Specimen material

Si/SiC/GaAs/GaN/InP/Glass/Sapphire etc

Specimen thickness

350–1000 μm

Specimen warpage

≤1 mm (≤3 mm with end effector)

Macro/micro observation accuracy

Min. 150–500 μm / 300 nm–1 μm

External dimensions

2270mm × 1810mm × 1950mm

Cartridges

SMIF Port

Cassette capacity

2

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