Suzhou Takchip Semiconductor Co., Ltd.

Confocal Micro Raman & PL Spectroscopy
Market in detail (QC/QA/FA/RD/Production line)
Semiconductor
Optoelectronics
Perovskite & Silicon Carbide
New energy & Battery
New materials & Ceramics
Chemical industry & Environmental protection
Pharmaceuticals
Jewelry & Forensic science

Confocal Micro Raman & PL Spectroscopy
Common inspection and measurement applications include:

Qualitative and quantitative analysis (foreign matter/residue analysis)

Surface residue stress (CMP stress changes/cutting/baking)

Real-time monitoring (electrochemical reactions/chemical concentration monitoring/catalytic reactions/material changes)

Structural changes (molecular changes/functional group changes/structural strength analysis)


Convenience highlights include:

Localization (recognized by major semiconductor manufacturers)

Customer satisfaction (high scalability/customization/automation)

Unlimited detection materials (from near-infrared to ultraviolet wavelengths)

Penetration testing (data collection at different depths)

Direct testing (no sample preparation required)

Feature spectrum database (accumulating the industry's largest 80,000 images)


ModelConfocal Micro Raman & PL Spectroscopy

Offline scenario @laboratory

Micro Raman Spectrometer:regular type

Offline scenario @laboratory

Micro Raman Spectrometer:12'' wafer mapping type

In-line scenario @fabrication/production line

Inline Micro Raman Spectrometer


SpecificationConfocal Micro Raman & PL Spectroscopy

Laser

1.  Raman/PL:224、266、325、355、375、405、442、458、473、514、532、632.8、671、785、808、830、1064、1350、1650 nm that accumulated 19 wavelengths
2.  Upconversion Photoluminescence:980 m
3.  Power controlling:Basic 18 steps ND filters  (0.01-100%) (selected for auto controlling)

Spectrograph

1.  Aberration converted imaging spectrograph:163、193、200、303、350、500、520、750、100 mm for focal length
2.  Silt motorized/manual adjustable from 10um to 2mm or larger-in-custom-made
3.  Raman shift resorlution: < 0.1 cm-1 per pixel @ (632.8nm + 1800gr/mm grating + 1000 mm focal length)
4.  Laser line cutoff: < 80cm-1 @ 458nm;< 60cm-1 @ 633 nm:< 100 cm-1 @ 830 nm

Image

A Koehler illumination for reflected white light system using a LED & 5M/6M pixels color CMOS camera

Detector

High sensitivity Back-thinned TE cooled CCD-Standard Pxiel format:2000 x 256 pixels

Mapping stage

XY-axis:Travel range Max. 100 x 100 mm、Min. step 50 (custom-made)
Z-axis:Z-depth:Min. step 10mm (custom-made)

Integration software

Solis & UniSCAN, system control and data quisition/processing
Beam switching, Laser power control, Confocal Pinhole, Spectrograph control image and signal measurement mapping, and data analysis

Upgrade version
Custom-made & Automation

1.  PL、TRPL、SERS、TERS  for enhanced light source
2.  AOI、NSOM、AFM for Image upgraded
3.  Prob station  for electrical test
4.  Environmental fixture, temperature fixture, bias fixture and so on for custom scenario requirements

Copyright © Suzhou Takchip Semiconductor Co., Ltd. All rights reserved SuICP No. 2024094040-1 Web design